Nanogallery
Nanogallery
TODAY SEPTEMBER 17, 2019

Electron-Beam Sculpting with 2-nm Resolution

Two nanoholes etched in a nanowire using e-beam.
Highly-focused, high-energy electron beam can be used to etch holes and to modify nanowires in various ways. The picture shows a nanowires, about 15 nm in diameter, with two nanoholes, each being about 2.5 nm in diameter. Making such small holes in metallic wires constitutes a significant achievement in nanofabrication. The method was perfected by Mikas Remeika, while working in Bezryadin laboratory. The images are courtesy M. Remeika and A. Bezryadin (Physics/UIUC).
The top picture shows a nanowire with two e-beam-etched holes. Pictures below illustrate the steps of nanofabrication. The wire is fabricated using molecular templating, as described in [1], however a transparent SiN membrane is used. The utilization of a membrane allows one to study the sample in a transmission electron microscope (TEM). Using a field emission electron source and high quality electron optics, the TEM beam can be focused to a spot of radius less than 1 nm. The beam of electrons is very powerful since electrons are accelerate by a voltage of 200000 Volts. Under these conditions the wire material evaporate and/or melts at the e-beam focus. This effect allows various patterns to be formed with about 2 nanometer resolution[2]. Microscope used: JEOL 2010F-FEG. The scale bar in the pictures is 10nm . [1] Bezryadin, A.; Lau, C. N.; Tinkham, M. Nature. 2000, v.404, p.971. [2] Remeika, M.; Bezryadin, A. Nanotechnology, 2004, v.16, p.1172.
See also images:
Step 1
Step 1
Step 2
Step 2
Step 3
Step 3
Step 4
Step 4
The substrate is dried off with forced nitrogen gas, and those nanotubes that settled onto the surface of the susbstrate may remain (highlighted). Some of these nanotubes my span the trench.
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