Nanogallery
Nanogallery
TODAY AUGUST 23, 2017

Electron-Beam Sculpting with 2-nm Resolution

Two nanoholes etched in a nanowire using e-beam.
Highly-focused, high-energy electron beam can be used to etch holes and to modify nanowires in various ways. The picture shows a nanowires, about 15 nm in diameter, with two nanoholes, each being about 2.5 nm in diameter. Making such small holes in metallic wires constitutes a significant achievement in nanofabrication. The method was perfected by Mikas Remeika, while working in Bezryadin laboratory. The images are courtesy M. Remeika and A. Bezryadin (Physics/UIUC).
The top picture shows a nanowire with two e-beam-etched holes. Pictures below illustrate the steps of nanofabrication. The wire is fabricated using molecular templating, as described in [1], however a transparent SiN membrane is used. The utilization of a membrane allows one to study the sample in a transmission electron microscope (TEM). Using a field emission electron source and high quality electron optics, the TEM beam can be focused to a spot of radius less than 1 nm. The beam of electrons is very powerful since electrons are accelerate by a voltage of 200000 Volts. Under these conditions the wire material evaporate and/or melts at the e-beam focus. This effect allows various patterns to be formed with about 2 nanometer resolution[2]. Microscope used: JEOL 2010F-FEG. The scale bar in the pictures is 10nm . [1] Bezryadin, A.; Lau, C. N.; Tinkham, M. Nature. 2000, v.404, p.971. [2] Remeika, M.; Bezryadin, A. Nanotechnology, 2004, v.16, p.1172.
See also images:
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Step 2
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Step 3
Step 3
Step 4
Step 4
Step 2
Nanowerk Nanotechnology Portal
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Nanohedron
http://www.nanohedron.com

Biomolecules
http://perso.curie.fr/Simon.Sc..


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