Nanogallery
Nanogallery
TODAY JULY 2, 2020


The substrate is then rinsed in a photoresist developer solution,
The substrate is then rinsed in a photoresist developer solution, in which all parts of the photoresist exposed to light are removed

The substrate is dried off with forced nitrogen gas, and those nanotubes that settled onto the surface of the susbstrate may remain (highlighted). Some of these nanotubes my span the trench.
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Nanohedron
http://www.nanohedron.com

Biomolecules
http://perso.curie.fr/Simon.Sc..


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