Nanogallery
Nanogallery
TODAY JULY 20, 2019


The trench is further defined using hydrofluoric acid. The HF etc
The trench is further defined using hydrofluoric acid. The HF etches the SiO2 layer much more quickly than the top layer of SiN, resulting in an under-etched trench.

Step 4
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Biomolecules
http://perso.curie.fr/Simon.Sc..


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