Nanogallery
Nanogallery
TODAY MAY 26, 2019


The trench is further defined using hydrofluoric acid. The HF etc
The trench is further defined using hydrofluoric acid. The HF etches the SiO2 layer much more quickly than the top layer of SiN, resulting in an under-etched trench.

Carbon nanotubes are deposited in solution onto the substrate. The nanotubes are allowed to settle and stick to the surface of the substrate.
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Biomolecules
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