Nanogallery
Nanogallery
TODAY DECEMBER 2, 2020


The trench is further defined using hydrofluoric acid. The HF etc
The trench is further defined using hydrofluoric acid. The HF etches the SiO2 layer much more quickly than the top layer of SiN, resulting in an under-etched trench.

The substrate is dried off with forced nitrogen gas, and those nanotubes that settled onto the surface of the susbstrate may remain (highlighted). Some of these nanotubes my span the trench.
Nanowerk Nanotechnology Portal
http://www.nanowerk.com

Nanohedron
http://www.nanohedron.com

Biomolecules
http://perso.curie.fr/Simon.Sc..


Nano-news | Nanosuperconductors | Nanofabrication | Nanophenomena | Journals | Web directory | contacts

20042012 Copyright by Nanogallery.info
Design by UpMrk